Product Center, Comprehensive Quantum Computing Product Support
Product Center
Comprehensive Quantum Computing Product Support
Origin Quantum develops quantum-computing technologies and products across hardware, software, cloud services, security and education. Explore product capabilities and use cases by category, or contact us for product information and consultation.
Micron Local Laser Annealing Instrument
Micron local laser annealing instrument can modify the frequency parameters of quantum bit, improve the yield of quantum chip, and solve the problem of bit frequency crowding in multi-bit expansion. The system can be configured with high vacuum annealing cavity and inert gas annealing cavity to realize the vacuum local annealing and inert gas atmosphere annealing functions of quantum chip. The system can also be applied to semiconductor chip, material surface modification and other fields.
Features
Quantum bit frequency modification accuracy over 95%
Laser power 0~3W adjustable, power stability RMS better than 1% (within 4h)
Annealing target region positioning accuracy up to 100 nm
The system is fully automatic control, can be multi-point one-key annealing
Micron light spot, laser spot shape size can be customized
Specifications
| Performance | |
| Repeatability of annealing | Resistance modification accuracy over 95% |
| Laser Spot | Diameter 20um土2um (Effective annealing range), Support custom shape size |
| Wavelength | 532nm |
| Annealing time control | Minimum annealing time 80ms |
| Output power | Adjust range 0~2.5W, step size 0.01W |
| Atmospheric annealing | 2-8inch, Vacuum/inert gas annealing: 2-4inch |
| Power Stability | RMS≤1%(within 4h) |
| Chip positioning accuracy | ±0.25um(X/Y direction) |
| Other | |
| Power source | 208~230V, 50/60 Hz 4kw |
| Working Temperature | 18-30℃ |
| Boundary dimension | 1400mm*1400mm*1800mm (length, width and height) |
| Relative humidity | <50%(Non -Condensing) |
| High Vacuum Chip Annealing Chamber (optional) | |
 | Vacuum degree of system: 1*10-4 Pa(Higher vacuum can be customized) |
| Inert Gas Chip Annealing Chamber (optional) | |
 | lnert Gas: high purity nitrogen, argon, neon, etc Maximum working pressure: 60psi |
